Although PVD techniques are widely used to fabricate metal coatings, the underlying non-equilibrium thermodynamics governing film nucleation and growth remains poorly understood. Here, we report an anomalous thermal-spike effect during PVD deposition that fundamentally deviates from the predictions of the classical Fourier model. Our theory reveals a trade-off between thermal effects and deposition-induced stress in regulating nanocrystal nucleation, while thermally driven nanocrystal growth proceeds predominantly through oriented-attachment coalescence rather than conventional diffusion-mediated growth. These findings establish a mechanistic basis for precise manipulation of nanocrystal phases during PVD coating fabrication.

PVD,Thermal spike effect,Nanocrystal,Nucleation and growth